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CeBix™ Installation Procedure
View the CeBix Installation Procedure PDF
Installing a CeBix™ cathode in a Self Biased or an Independently Biased System
If you have a Self Biased System and are installing a CeBix™ cathode, you must:
1. Increase the distance between the tip of the crystal and the Wehnelt cap. For example, when installing a cathode in a JEOL JBX‐5DII Lithography system, the crystal truncation should be recessed from the front surface of the Wehnelt 3⁄5 a turn for LaB6, or 3⁄4 turn for CeBix™. Use a similar tip distance relationship when installing CeBix™ in other LaB6 instruments.
-OR-
2. Increase the bias resistance by a factor of 2.
*In some cases you will need to perform a combination of #1 and #2
If you have an Independently Biased System and are installing a CeBix™ cathode, simply operate it the same way as you would operate a LaB6 cathode. Do expect, however, the total emission current to be approximately half of that obtained when operating a LaB6 cathode.
If you have any questions on how to install your CeBix™ cathode, please Contact Us!
